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Semiconductor Exposure Equipment

Semiconductors are constantly evolving, achieving ever-higher levels of performance and functionality. Amid this evolution, circuit line widths continue to shrink, decreasing from 45 nm to 32 nm. Canon, through its semiconductor exposure equipment, meets the strict cutting-edge demands of the industry while focusing on the development of future technologies. These technologies serve as the driving force behind Canon's optical and control technologies.

Semiconductor Exposure Equipment

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For information on semiconductor exposure equipment, please view CANON TECHNOLOGY HIGHLIGHTS (pp.44-45).

  • Immersion Exposure Technology (P.44)
  • Stage Synchronization Control Technology (P.45)
  • Exposure Equipment Application Platform (P.45)
  • Next-Generation Exposure Technology (P.45)

CANON TECHNOLOGY HIGHLIGHTS